Tantalum Àkọlé
Ọja sile
| Orukọ ọja: ibi-afẹde tantalum mimọ ti o ga julọ | |
| Ohun elo | Tantalum |
| Mimo | 99.95% iṣẹju tabi 99.99% iṣẹju |
| Àwọ̀ | Irin didan, fadaka ti o tako ipata pupọ. |
| Oruko miran | Ta afojusun |
| Standard | ASTM B708 |
| Iwọn | Dia> 10mm * nipọn> 0.1mm |
| Apẹrẹ | Planar |
| MOQ | 5pcs |
| Akoko Ifijiṣẹ | 7 ọjọ |
| Lo | Sputtering Coating Machines |
Table 1: Kemikali tiwqn
| Kemistri (%) | |||||||||||||
| Orúkọ | Olori paati | Awọn impurities maxmium | |||||||||||
| Ta | Nb | Fe | Si | Ni | W | Mo | Ti | Nb | O | C | H | N | |
| Ta1 | Iyokù | 0.004 | 0.003 | 0.002 | 0.004 | 0.006 | 0.002 | 0.03 | 0.015 | 0.004 | 0.0015 | 0.002 | |
| Ta2 | Iyokù | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.08 | 0.02 | 0.01 | 0.0015 | 0.01 | |
Tabili 2: Awọn ibeere ẹrọ (ipo annealed)
| Iwọn ati iwọn | Annealed | ||
| Agbara fifẹmin, psi (MPa) | Agbara ikore min,psi (MPa)(2%) | Ilọju min, % (ipari gage 1 inch) | |
| Iwe, bankanje. ati ọkọ (RO5200, RO5400) Sisanra <0.060"(1.524mm)Sisanra≥0.060"(1.524mm) | 30000 (207) | Ọdun 20000 (138) | 20 |
| 25000 (172) | 15000 (103) | 30 | |
| Ta-10W (RO5255)Iwe, bankanje. ati ọkọ | 70000 (482) | 60000 (414) | 15 |
| 70000 (482) | 55000 (379) | 20 | |
| Ta-2.5W (RO5252)Sisanra <0.125" (3.175mm)Sisanra≥0.125" (3.175mm) | 40000 (276) | 30000 (207) | 20 |
| 40000 (276) | 22000 (152) | 25 | |
| Ta-40Nb (RO5240)Sisanra <0.060"(1.524mm) | 40000 (276) | Ọdun 20000 (138) | 25 |
| Sisanra>0.060"(1.524mm) | 35000 (241) | 15000 (103) | 25 |
Iwọn ati Mimọ
Iwọn: diamita (50 ~ 400) mm
Sisanra: (3-28mm)
Ipele: RO5200,RO 5400, RO5252(Ta-2.5W) , RO5255(Ta-10W)
Mimọ:>=99.95%,>=99.99%
Anfani wa
Recrystallization: 95% kere Ọkà iwọn: kere 40μm Dada roughness: Ra 0.4 max Flatness: 0.1mm tabi 0.10% max. Ifarada: ifarada iwọn ila opin +/- 0.254
Ohun elo
Ibi-afẹde Tantalum, bi ohun elo elekiturodu ati ohun elo imọ-ẹrọ dada, ti ni lilo pupọ ni ile-iṣẹ ti a bo ti ifihan gara-iṣan omi (LCD), ipata sooro ooru ati adaṣe giga.
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